| Item |
Parameter |
The size |
a.100X100X2－3mm；b.75X75X2—3mm；c.63X63X2—3(can choose)； |
Silicon size |
φ35—75mm |
The line |
3-4μm, The thinnest can be 2μm |
Mask and silicon displacement range |
X/Y±2.5mm,(rotation) ±6° |
Worktable rotate around the principal axis |
Coarse adjustment 360° can be fine adjusted. |
Worktable moving range |
X,Y compose φ75mm |
The? worktable’s tee surface to the moulding board |
0—7.5mm |
Exposal light |
GCQ200W over high pressure HG light，Exposal wave length，300―436nm |
Exposal system should be above? |
7mw |
Exposal system uniformity of illuminance range should be in φ75mm |
±5％ |
Microscopical lighting wave length |
≈545nm |
Time of exposure control range |
0.1 sec—99 min |
Amplification of the binocular microscope |
a. Two kinds ocular:10X,16X；b. Three kind plan objective :6X,9X,15X；c.Composed magnification ratio.:60X—240X； |
Vacuum contact pressure |
≥0.7kgf |
Dimension |
1000X850X980mm(two pcs) |
Weight |
200kg |
Add: If the user had any special request, please contact with us.
